Schottky Contact

Application ID: 16367


Schottky Contact

This benchmark simulates the behavior of an ideal Schottky barrier diode made of a tungsten contact deposited on a silicon wafer. The resulting J-V (current density vs. applied voltage) curve obtained from the model under forward bias is compared with experimental measurements found in the literature

この model の例は, 通常次の製品を使用して構築されるこのタイプのアプリケーションを示しています.