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This model is a benchmark for three-phase flow commonly used in food processing, pharmaceutical industry, and chemical processing. The results are validated against data reported in the literature. A gas bubble rises through two layers of liquid, a lighter liquid resting on top of a ... 詳細を見る
Gas cells have several applications in the design of scientific instruments. A gas cell is used to define a high-pressure region within the instrument's main vacuum system. For example, in this application, note we are designing a high-pressure region 100 mm long, with an operating ... 詳細を見る
This example shows how to set up a glacier flow model in principle, containing several important aspects of glacier modeling: The creation of the 2D geometry, the modeling of non-Newtonian flow, and the implementation of basal sliding. In this example, two different glacier types, a cold ... 詳細を見る
This problem follows a typical preliminary board-level thermal analysis. First perform a simulation of the board with some Integrated Circuits (ICs). Then, add a disk-stack heat sink to observe cooling effects. Finally, explore adding a copper layer to the bottom of the board in order to ... 詳細を見る
This example demonstrates how to model coupled flow, heat transfer, and structural deformation and stress in a pipeline network. Gravity loads from the pipe and fluid are also taken into account. 詳細を見る
One method for removing cancerous tumors from healthy tissue is to heat the malignant tissue to a critical temperature that kills the cancer cells. This example accomplishes the localized heating by inserting a four-armed electric probe through which an electric current runs. Equations ... 詳細を見る
This example illustrates multiphase flow modeling in an airlift loop reactor. The reactor is filled with water and air bubbles are injected at the bottom through two frits. Due to buoyancy, the bubbles rise, inducing a circulating motion of the liquid. The model specifically investigates ... 詳細を見る
Ion implantation is used extensively in the semiconductor industry to implant dopants into wafers. Within an ion implanter, ions generated within an ion source are accelerated by an electric field to achieve the desired implant energy. Ions of the correct charge state are selected by ... 詳細を見る
