アプリケーションギャラリには電気, 構造, 音響, 流体, 熱および化学分野に関連する COMSOL Multiphysics® チュートリアルおよびデモアプリファイルが用意されています. これらの例はチュートリアルモデルまたはデモアプリファイルとそれに付随する手順をダウンロードすることにより独自のシミュレーション作業の開始点として使用できます.
クイック検索機能を使用して専門分野に関連するチュートリアルやアプリを検索します. MPHファイルをダウンロードするには, ログインするか, 有効な COMSOL ライセンスに関連付けられている COMSOL Access アカウントを作成します. ここで取り上げた例の多くは COMSOL Multiphysics® ソフトウェアに組み込まれ ファイルメニューから利用できるアプリケーションライブラリからもアクセスできることに注意してください.
この例では, ラージエディシミュレーション (LES) を使用して, 時速 180 km で走行するスポーツカーの周りの乱流をシミュレートします. 詳細を見る
This tutorial model solves for a hydrogen plasma created in a microwave cavity. The model computes the fluid flow and gas heating self-consistently. 詳細を見る
This tutorial model solves for an inductively coupled plasma reactor with RF bias (also known as ICP/CCP reactors) in a mixture of argon/chlorine. The model computes the fluid flow and gas heating. Important aspects and strategies for modeling electronegative discharges are discussed. 詳細を見る
These models are featured in the blog post Analyze Violin Tone and Volume with Multiphysics Modeling. One applies acoustic-structure interaction to study how the air mode resonance is affected by the coupled vibrations in the violin body. The other uses a potential flow approximation to ... 詳細を見る
This example shows how to model Lithium diffusion in a silicon electrode that swells. The model shows how swelling-induced plastic deformation can increase the maximum state of charge (SOC). 詳細を見る
A plane electromagnetic wave propagating through free space is incident at an angle upon an infinite dielectric medium. This model computes the reflection and transmission coefficients and compares to the Fresnel equations. 詳細を見る
An antenna array is a group of radiating elements. By controlling the phase and magnitude of the input signal assigned to each antenna element and the number of array elements, the radiation pattern can be steered in a desired direction with a preferred level of gain. In this example, a ... 詳細を見る
In the semiconductor industry, rapid thermal annealing (RTA) is a semiconductor process step used for the activation of dopants and the interfacial reaction of metal contacts. In principle, the operation involves rapid heating of a wafer from ambient to approximately 1000–1500 K. As soon ... 詳細を見る
The present model example is based on Copper Deposition in a Trench model available in Electrodeposition Application Library. The nonuniform deposition along the trench surface leads to formation of a cavity/void. Since the Deformed Geometry interface cannot handle topological changes, ... 詳細を見る
Oxide jacking is the process by which reinforced concrete cracks, due to the corrosion of the reinforcing rebar rods. The corrosion process causes growth of an oxide layer on the rebar, which in turn causes internal stresses in the concrete. If the corrosion process is allowed to ... 詳細を見る