アプリケーションギャラリには電気, 構造, 音響, 流体, 熱および化学分野に関連する COMSOL Multiphysics® チュートリアルおよびデモアプリファイルが用意されています. これらの例はチュートリアルモデルまたはデモアプリファイルとそれに付随する手順をダウンロードすることにより独自のシミュレーション作業の開始点として使用できます.
クイック検索機能を使用して専門分野に関連するチュートリアルやアプリを検索します. MPHファイルをダウンロードするには, ログインするか, 有効な COMSOL ライセンスに関連付けられている COMSOL Access アカウントを作成します. ここで取り上げた例の多くは COMSOL Multiphysics® ソフトウェアに組み込まれ ファイルメニューから利用できるアプリケーションライブラリからもアクセスできることに注意してください.
Electronic equipment often has to be certified to function after having been subjected to a specified shock load. In this example, the effect of an 50g 11ms half sine shock on a circuit board is investigated using response spectrum analysis. The results are compared with a time domain ... 詳細を見る
This example models time-dependent copper deposition on a resistive wafer in a cupplater reactor. As the deposited layer builds up, the resistive losses of the deposited layer decreases. The benefit of using a current thief for a more uniform deposit is demonstrated. 詳細を見る
Chemical mechanical polishing (CMP) is a crucial technique for surface planarization, widely used in semiconductor fabrication and optical device manufacturing. This model simulates the flow field within the CMP retaining ring and tracks the motion of abrasive particles carried by the ... 詳細を見る
One of the ways we can simplify and reduce the size and computational complexity of a finite element model is by using any symmetries present in a model. In this entry, you can find three practical examples highlighting how to exploit symmetries in RF or wave optics modeling. They all ... 詳細を見る
When modeling the propagation of charged particle beams at high currents and relativistic speeds, the space charge and beam current create significant electric and magnetic forces that tend to expand and focus the beam, respectively. The Charged Particle Tracing interface uses an ... 詳細を見る
In the semiconductor industry, rapid thermal annealing (RTA) is a semiconductor process step used for the activation of dopants and the interfacial reaction of metal contacts. In principle, the operation involves rapid heating of a wafer from ambient to approximately 1000–1500 K. As soon ... 詳細を見る
The flash method is widely used for measuring the thermal conductivity of a thin sample material that is about the size of a coin. The sample material is submitted to a laser pulse on one of its faces. In turn, the opposite face is heated up by around 1 K. As the pulse is uniform and ... 詳細を見る
This model demonstrates how to simulate surface plasmon polaritons in a thin metal layer embedded in dielectric layers. It calculates the dispersion and propagation length of surface plasmon polaritons as a function of photon energy. 詳細を見る
This is a model of an adapter for microwave propagation in the transition between a rectangular and an elliptical waveguide. Such waveguide adapters are designed to keep energy losses due to reflections at a minimum for the operating frequencies. To investigate the characteristics of the ... 詳細を見る
This model simulates the propagation of a positive streamer in a weak electric field where the process of photoionization is essential to provide seed electrons at the front of the streamer head. The simulated electric field and electron density as a function of time agree well with that ... 詳細を見る
