アプリケーションギャラリには電気, 構造, 音響, 流体, 熱および化学分野に関連する COMSOL Multiphysics® チュートリアルおよびデモアプリファイルが用意されています. これらの例はチュートリアルモデルまたはデモアプリファイルとそれに付随する手順をダウンロードすることにより独自のシミュレーション作業の開始点として使用できます.
クイック検索機能を使用して専門分野に関連するチュートリアルやアプリを検索します. MPHファイルをダウンロードするには, ログインするか, 有効な COMSOL ライセンスに関連付けられている COMSOL Access アカウントを作成します. ここで取り上げた例の多くは COMSOL Multiphysics® ソフトウェアに組み込まれ ファイルメニューから利用できるアプリケーションライブラリからもアクセスできることに注意してください.
This tutorial model solves for an inductively coupled plasma reactor in a mixture of SF6/argon. The model computes the fluid flow and gas heating. Important aspects and strategies for modeling electronegative discharges are discussed. 詳細を見る
This tutorial model solves for a hydrogen plasma created in a microwave cavity. The model computes the fluid flow and gas heating self-consistently. 詳細を見る
This tutorial model solves for an inductively coupled plasma reactor with RF bias (also known as ICP/CCP reactors) in a mixture of argon/chlorine. The model computes the fluid flow and gas heating. Important aspects and strategies for modeling electronegative discharges are discussed. 詳細を見る
This tutorial model solves for an inductively coupled plasma reactor in a mixture of argon/oxygen. The model computes the fluid flow and gas heating. Important aspects and strategies for modeling electronegative discharges are discussed. 詳細を見る
In this example, a hydrogen plasma reactor at moderate pressure is studied using a global model. The heavy species heat equation is included. In the first part of the study, a Maxwellian electron energy distribution function is used. In the second part, the global model is solved self ... 詳細を見る
In this example, the etching of silicon in a CF4/O2 plasma reactor is studied using a global model. Parametric sweeps for ion energy and oxygen mole fraction are computed. 詳細を見る
This tutorial studies the deposition of amorphous silicon using an inductively coupled plasma reactor with a silane/argon gas mixture. It examines how the deposition rate varies across the wafer as a function of silane mole fraction and input power. 詳細を見る
The pyrolysis of a centimeter-sized wood particle presents a fully coupled multiphysics problem with mass transfer, fluid flow, and heat transfer. This example model consists of two parts. The first part demonstrates how to set up a model describing the pyrolysis of a porous, ... 詳細を見る
This tutorial studies the etching of silicon using an inductively coupled plasma reactor with an RF bias in a mixture of CF4/O2. The etching rate is computed along the wafer as a function of the RF bias voltage. 詳細を見る
