Luke T. Gritter, Sergei Yushanov, Jeffrey S. Crompton, and Kyle C. Koppenhoefer
AltaSim Technologies
Columbus, OH
AltaSim Technologies provides engineering consulting services involving advanced multiphysics modeling such as capacitively coupled plasma (CCP). Plasma etching and deposition of thin films, critical processes in the manufacture of advanced microelectronic devices, commonly utilize CCP, in which the plasma is initiated and sustained by an oscillating electric field between two or more electrodes.
Analysis of CCP is difficult due to the dynamic behavior of the plasma and the large number of RF cycles necessary to reach a periodic steady state. By performing one- and two-dimensional simulations of low-frequency RF discharges in axisymmetric CCP reactors for Maxwellian and non-Maxwellian cases using COMSOL Multiphysics, AltaSim Technologies has developed simulations which can be used to assist with the development of new CCP processing technology.
Suggested Stories
Fine Tuning for Water Purification
Amsterdam Water Supply (AWS) of the Netherlands produces some of the cleanest drinking water in the world using an ...
シミュレーションによるシリコンフォトニック MEMS 移相器の設計
スイス連邦工科大学ローザンヌ校の研究者は, シミュレーションを使用して, シリコンフォトニック MEMS 移相器の光学的および電気機械的性能を最適化し, それによって光ファイバーネットワークの速度, 容量, ...
Behind the Rumble and Roar of Mahindra Motorcycles
Optimization is a subtle and delicate art, especially when it comes to motorcycles. Regulatory requirements on pass-by ...
Keynote: Modeling Low-Temperature Superconducting Devices in COMSOL Multiphysics®
In this keynote talk from the COMSOL Conference 2024 Boston, Anil Erol of Northrop Grumman shares how his team uses ...
