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Chemical vapor deposition (CVD) is a process used to grow thin films on substrates. In this CVD example, metal inserts for machining tools are coated with titanium nitride (TiN). The titanium nitride layer improves the wear resistance of the metal inserts by increasing the hardness, reducing friction, and reducing oxidation. Additionally, due to its golden appearance, the coating process is also performed for aesthetic purposes.The CVD reactor in this example operates at low pressures and high temperatures. These operating conditions ensure high diffusion, which is needed for efficient mass transfer onto the substrate surfaces and for homogeneous deposition thicknesses.