Charged Particle Tracing in Semiconductor Manufacturing

Particle tracing modeling and simulation is important for accurately predicting the motion of ions or electrons in electric or magnetic fields. As an example, ion beams play a crucial role in semiconductor manufacturing during the etching process. Key properties are the etching profile, the effects of sputtering, and the incidence scheme. Particle tracing can be used to model these effects, leading to a deeper understanding and the optimization of the process.

The Particle Tracing Module, an add-on to COMSOL Multiphysics^®, is equipped with specialized functionality for particle tracing models. For instance, the software offers various predefined forces that affect the motion of particles, such as electric, magnetic, gravitational, and collisional forces. Custom-defined expressions can also be incorporated to account for the particles' interactions with other fields. Furthermore, the software contains unique functionality for using bidirectional couplings between fields and particles, specifically for situations where particles impact electromagnetic fields.

This webinar will demonstrate the capabilities of the Particle Tracing Module and showcase how to optimize the use of the module when simulating charged particle tracing.