アプリケーションギャラリには電気, 構造, 音響, 流体, 熱および化学分野に関連する COMSOL Multiphysics® チュートリアルおよびデモアプリファイルが用意されています. これらの例はチュートリアルモデルまたはデモアプリファイルとそれに付随する手順をダウンロードすることにより独自のシミュレーション作業の開始点として使用できます.
クイック検索機能を使用して専門分野に関連するチュートリアルやアプリを検索します. MPHファイルをダウンロードするには, ログインするか, 有効な COMSOL ライセンスに関連付けられている COMSOL Access アカウントを作成します. ここで取り上げた例の多くは COMSOL Multiphysics® ソフトウェアに組み込まれ ファイルメニューから利用できるアプリケーションライブラリからもアクセスできることに注意してください.
This tutorial model demonstrates how to compute the impedance of a capacitively coupled plasma. The Time Periodic study computes the time periodic solution of the plasma. Subsequently, the solution is transformed to the time domain, after which the fast Fourier transform (FFT) solver is ... 詳細を見る
This model shows how to simulate a capacitively actuated surface micromachined accelerometer, using the Electromechanics Interface. It is based on a case study from the book Microsystem Design by Stephen D. Senturia (Kluwer Academic Publishers, 5th Edition, 2003, pages 513-525). 詳細を見る
Steel structures immersed in seawater can be protected from corrosion through cathodic protection. This protection can be achieved by an impressed external current or by using sacrificial anodes. The use of sacrificial anodes is often preferred due to its simplicity. This example models ... 詳細を見る
This tutorial model explains how to extract lumped matrices by means of the Stationary Source Sweep study. The capacitance matrix of a five-terminal system is used to infer the position of a metallic object similar to real-world capacitive position sensors. The example illustrates the ... 詳細を見る
This tutorial studies the etching of silicon using an inductively coupled plasma reactor with an RF bias in a mixture of CF4/O2. The etching rate is computed along the wafer as a function of the RF bias voltage. 詳細を見る
In this example, an SF6/argon plasma reactor at moderate pressure is studied using a global model. The heavy species heat equation is included. Parametric sweeps for input power and argon mole fraction are computed. 詳細を見る
This model simulates an electrodeless lamp with argon/mercury chemistry. The low excitation threshold for mercury atoms means that even though the mercury is present in small concentrations, its behavior dominates. There is strong UV emission from the plasma at 185 nm and 253 nm. The UV ... 詳細を見る
Plasma discharges containing chlorine are commonly used to etch semiconductors and metals in microelectronics fabrication. This tutorial model studies chlorine plasma discharges using a global (volume-averaged) diffusion model. Global diffusion models can run simulations in a fraction ... 詳細を見る
This model simulates a holographic page data storage system. The studies include the recording and retrieval processes. The object beam encrypting 8-bit data is focused into a holographic material by a Fourier lens (Fourier transformation). In the recording process, the object beam ... 詳細を見る
This 3D model of a nanowire MOSFET employs the density-gradient theory to add the effect of quantum confinement to the conventional drift-diffusion formulation, without requiring excessively high computational costs. The oxide layer is simulated explicitly with geometric domains, and ... 詳細を見る