アプリケーションギャラリには電気, 構造, 音響, 流体, 熱および化学分野に関連する COMSOL Multiphysics® チュートリアルおよびデモアプリファイルが用意されています. これらの例はチュートリアルモデルまたはデモアプリファイルとそれに付随する手順をダウンロードすることにより独自のシミュレーション作業の開始点として使用できます.
クイック検索機能を使用して専門分野に関連するチュートリアルやアプリを検索します. MPHファイルをダウンロードするには, ログインするか, 有効な COMSOL ライセンスに関連付けられている COMSOL Access アカウントを作成します. ここで取り上げた例の多くは COMSOL Multiphysics® ソフトウェアに組み込まれ ファイルメニューから利用できるアプリケーションライブラリからもアクセスできることに注意してください.
When anodizing aluminum, the surface is electrochemically altered to form an abrasive and corrosion-resistive Al2O3 film. The electrode kinetics during the process are only marginally affected as the oxide layer grows, so a stationary analysis of the current distribution is sufficient to ... 詳細を見る
This example demonstrates the usage of current terminal to compute the resistive heating of a busbar. 詳細を見る
This tutorial shows how to model tissue heating induced by focused ultrasound. First, the stationary acoustic field in the water and the tissue are modeled to obtain the acoustic intensity distribution in the tissue. The absorbed acoustic energy is then calculated and used as the heat ... 詳細を見る
This model demonstrates the switching capability of a liquid crystal (LC) display cell in In-Plane Switching (IPS) configuration. The Oseen-Frank model is used to solve for the LC director (optical axis) distribution when a static electric field is applied. A Weak Form PDE interface is ... 詳細を見る
A paraboloidal dish can concentrate solar energy onto a target (receiver), resulting in very high local heat fluxes. This can be used to generate steam, which can be used to power a generator, or hydrogen, which can be used directly as a fuel source. In this model, the heat flux arriving ... 詳細を見る
Surface plasmon-based circuits are being used in applications such as plasmonic chips, light generation, and nanolithography. The Plasmonic Wire Grating Analyzer application computes the coefficients of refraction, specular reflection, and first-order diffraction as functions of the ... 詳細を見る
KOH(aq), an alkali metal hydroxide solution, is widely used in anisotropic wet etching technology and is one of the most commonly utilized solutions for micromachining silicon wafers. Anisotropic etching refers to a process where the etching rate varies in different directions, primarily ... 詳細を見る
A thin-walled frame with a central cutout is subjected to a random load. Although the stresses are far below the yield level of the material, damage accumulates over the load history. The Rainflow counting algorithm is used to define the load scenario and Palmgren-Miner linear damage ... 詳細を見る
This example shows a 2D plane stress model of a thin tapered cantilever. Different boundary and load scenarios are examined. It is demonstrated how to apply and how to evaluate different load and constraint groups. Resulting stresses are compared to NAFEMS benchmark values and they are ... 詳細を見る
Microstrip filters can be fabricated directly on a printed circuit board (PCB) with a microstrip line going from the input to the output. Along the microstrip line there are a number of stubs of certain lengths and widths. The design of the filter involves choosing the impedance of the ... 詳細を見る
