アプリケーションギャラリには電気, 構造, 音響, 流体, 熱および化学分野に関連する COMSOL Multiphysics® チュートリアルおよびデモアプリファイルが用意されています. これらの例はチュートリアルモデルまたはデモアプリファイルとそれに付随する手順をダウンロードすることにより独自のシミュレーション作業の開始点として使用できます.
クイック検索機能を使用して専門分野に関連するチュートリアルやアプリを検索します. MPHファイルをダウンロードするには, ログインするか, 有効な COMSOL ライセンスに関連付けられている COMSOL Access アカウントを作成します. ここで取り上げた例の多くは COMSOL Multiphysics® ソフトウェアに組み込まれ ファイルメニューから利用できるアプリケーションライブラリからもアクセスできることに注意してください.
Mass transport limitations within thin crevices can often result in the local electrochemistry to differ significantly between the crevice opening (mouth) and end (tip), and as a result of the differences in local chemistry, corrosion may occur. This example models crevice corrosion of ... 詳細を見る
This model simulates a temperature profile in a number of cells and cooling fins in a liquid-cooled battery pack. The model solves in 3D and for an operational point during a load cycle. A full 1D electrochemical model for the lithium battery calculates the average heat source. 詳細を見る
This model illustrates the working principle of a passive electrodynamic bearing. An electrically conducting rotor rotating in a magnetic field produced by a permanent magnets induces eddy currents on the conducting rotor. The eddy currents, in turn, produce a magnetic field that opposes ... 詳細を見る
In this tutorial, a PM motor with 10 rotor poles and 12 stator slots is modeled in 2D, to capture the torque ripple over an electrical period and map the volumetric loss density in the rotor and stator iron. 詳細を見る
Impressed current cathodic protection is a commonly employed strategy to mitigate the ship hull corrosion where an external current is applied to the hull surface, polarizing it to a lower potential. In this model, the effect of propeller coating on the current demand is demonstrated. 詳細を見る
In this example, an SF6/argon plasma reactor at moderate pressure is studied using a global model. The heavy species heat equation is included. Parametric sweeps for input power and argon mole fraction are computed. 詳細を見る
Plasma discharges containing chlorine are commonly used to etch semiconductors and metals in microelectronics fabrication. This tutorial model studies chlorine plasma discharges using a global (volume-averaged) diffusion model. Global diffusion models can run simulations in a fraction ... 詳細を見る
This models pressure-dependent heating of 4 inch wafer on unipolar electrostatic chuck. Wafer sits on top of ring with electrostatic force holdong down wafer to counter upward pressure from gas flowing in gap between wafer and chuck surface. It is a problem involving 4 coupled physics ... 詳細を見る
This model demonstrates how to use the Magnetic Fields, Currents Only interface together with the Stationary Source Sweep with Initialization study to compute the inductance matrix of PCB coils with a number of 12. 詳細を見る
This 3D model of a nanowire MOSFET employs the density-gradient theory to add the effect of quantum confinement to the conventional drift-diffusion formulation, without requiring excessively high computational costs. The oxide layer is simulated explicitly with geometric domains, and ... 詳細を見る