ASML Advances Photolithography Systems with Multiphysics Simulation
Fred Huizinga, ASML, Netherlands
At ASML, the development of cutting-edge computer chips and the machinery to produce them requires a complex understanding of the many coupled physical processes involved. To design machines at this level of precision requires simulation at every step, making the availability of a comprehensive simulation toolbox invaluable. For example, engineers at ASML worked on the design of an air bearing responsible for high-precision movements in photolithography machines. They also created simulation apps to allow colleagues throughout the team to virtually test the performance of different designs.
Suggested Stories
Optimizing Fluid Sensors for Industrial Process Measurement
Endress+Hauser, a global leader in measurement instrumentation for industrial process engineering, is using ...
海のアルカリ性を保つ, 腐敗した貝殻のしくみ
貝殻は腐敗すると同時に炭酸カルシウムを放出し, 海水中の二酸化炭素を中和する働きがあります. しかし, 海洋酸性化によって, 貝殻の形成プロセスが脅かされています. ユトレヒト大学の Olivier Sulpis 氏は, ...
Keynote: Using COMSOL Multiphysics® for Circuit Board Thermal Analysis
The aerospace and defense industry requires stronger circuit boards than those needed for everyday electronics due to ...
Restoration of Lake Water Environments
Human activity steals oxygen from natural water sources such as lakes and this oxygen-deficient water often contains ...
