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A detailed description of these models can be found in our blog post “How Should I Evaluate Singular Stress Fields?”. The models are: notchedStrip.mph – Model for the initial studies of the stress field properties. singularityPower.mph – Small model solving the transcendental equation ... 詳細を見る
This model captures the dynamic resistive switching behavior of an oxide-based memristor. The device features a thin metal oxide layer sandwiched between two metal electrodes. When a voltage is applied, oxygen vacancies within the oxide layer migrate, acting as charge carriers and ... 詳細を見る
In signal integrity (SI) applications, time-domain reflectometry (TDR) is a useful technique for analyzing the discontinuity in a signal path by observing the reflected signal strength. The reflected signal distorts the input pulse mainly by impedance mismatch if there is no external ... 詳細を見る
The model demonstrates the basics of the 3-omega method. The coupled electromagnetic heating problem is solved in a solid sample which is heated by a thin copper strip, deposited on the surface of a sample. Analyzing the frequency dependence of the voltage oscillation amplitude, we ... 詳細を見る
Interference fit is a technique used to join two parts by fitting one over or around the other. The inner part is cooled so that it shrinks and can be fitted on the outer part. Once the part returns to its original temperature and expands, a contact pressure builds up at the interface ... 詳細を見る
Gyroscopes are used to measure orientation or maintain the stability of vehicles such as airplanes, spacecraft, and submarines. They are also used as sensors in inertial guidance systems. This model demonstrates the modeling of a mechanical gyroscope. It analyzes the response of a ... 詳細を見る
Chemical vapor deposition (CVD) is a process used to grow thin films on substrates. In this CVD example, metal inserts for machining tools are coated with titanium nitride (TiN). The titanium nitride layer improves the wear resistance of the metal inserts by increasing the hardness, ... 詳細を見る
Chemical vapor deposition (CVD) is an important step in the process of manufacturing microchips. One common application is the deposition of silicon on wafers in low pressure reactors to obtain uniform deposition thicknesses. This example models the coupled reaction kinetics, fluid ... 詳細を見る
