アプリケーションギャラリには電気, 構造, 音響, 流体, 熱および化学分野に関連する COMSOL Multiphysics® チュートリアルおよびデモアプリファイルが用意されています. これらの例はチュートリアルモデルまたはデモアプリファイルとそれに付随する手順をダウンロードすることにより独自のシミュレーション作業の開始点として使用できます.
クイック検索機能を使用して専門分野に関連するチュートリアルやアプリを検索します. MPHファイルをダウンロードするには, ログインするか, 有効な COMSOL ライセンスに関連付けられている COMSOL Access アカウントを作成します. ここで取り上げた例の多くは COMSOL Multiphysics® ソフトウェアに組み込まれ ファイルメニューから利用できるアプリケーションライブラリからもアクセスできることに注意してください.
Loudspeaker design is a challenging task, where the design objective is to achieve better sound quality without violating manufacturing and operational constraints. The quality of sound depends on many parameters; one of them is the ability to control, damp, and shift the diaphragm ... 詳細を見る
This model simulates a plasma at medium pressure (2 torr) where the plasma is still not in local thermodynamic equilibrium. At low pressures the two temperatures are decoupled but as the pressure increases the temperatures tend towards the same limit. 詳細を見る
This tutorial studies the deposition of amorphous silicon using an inductively coupled plasma reactor with a silane/argon gas mixture. It examines how the deposition rate varies across the wafer as a function of silane mole fraction and input power. 詳細を見る
This is an example of a model of an induction motor in which eddy currents are induced in the rotor by time-harmonic currents in the stator windings and the rotor's rotation. Induced currents in the rotor interact with the magnetic field that is produced by the coils to generate the ... 詳細を見る
This tutorial model solves for an inductively coupled plasma reactor with RF bias (also known as ICP/CCP reactors) in a mixture of argon/chlorine. The model computes the fluid flow and gas heating. Important aspects and strategies for modeling electronegative discharges are discussed. 詳細を見る
This tutorial studies the etching of silicon using an inductively coupled plasma reactor with an RF bias in a mixture of CF4/O2. The etching rate is computed along the wafer as a function of the RF bias voltage. 詳細を見る
This model presents a 2D axisymmetric dipolar microwave plasma source sustained through resonant heating of the electrons. This is known as electron cyclotron resonance (ECR), which occurs when a suitable high magnetic flux density is present along with the microwaves. This is an ... 詳細を見る
This tutorial models an ICP reactor by solving plasma fluid type equations fully coupled with the homogeneous and time-independent electron Boltzmann equation in the classical two-term approximation. The approximated Boltzmann equation is solved for each position of space and is coupled ... 詳細を見る
This tutorial model solves for an inductively coupled plasma reactor in a mixture of SF6/argon. The model computes the fluid flow and gas heating. Important aspects and strategies for modeling electronegative discharges are discussed. 詳細を見る
This tutorial model solves for an inductively coupled plasma reactor in a mixture of argon/oxygen. The model computes the fluid flow and gas heating. Important aspects and strategies for modeling electronegative discharges are discussed. 詳細を見る
