アプリケーションギャラリには電気, 構造, 音響, 流体, 熱および化学分野に関連する COMSOL Multiphysics® チュートリアルおよびデモアプリファイルが用意されています. これらの例はチュートリアルモデルまたはデモアプリファイルとそれに付随する手順をダウンロードすることにより独自のシミュレーション作業の開始点として使用できます.
クイック検索機能を使用して専門分野に関連するチュートリアルやアプリを検索します. MPHファイルをダウンロードするには, ログインするか, 有効な COMSOL ライセンスに関連付けられている COMSOL Access アカウントを作成します. ここで取り上げた例の多くは COMSOL Multiphysics® ソフトウェアに組み込まれ ファイルメニューから利用できるアプリケーションライブラリからもアクセスできることに注意してください.
In this tutorial, the heat and mass transport equations are coupled to laminar flow in order to model exothermic reactions in a parallel plate reactor. It exemplifies how you can use COMSOL Multiphysics to systematically set up and solve increasingly sophisticated models using predefined ... 詳細を見る
In this application, a solution is pumped through a catalytic bed where a solute species reacts as it gets in contact with the catalyst. The purpose of this example is to maximize the total reaction rate for a given total pressure difference across the bed by finding an optimal catalyst ... 詳細を見る
Chemical vapor deposition (CVD) is a process used to grow thin films on substrates. In this CVD example, metal inserts for machining tools are coated with titanium nitride (TiN). The titanium nitride layer improves the wear resistance of the metal inserts by increasing the hardness, ... 詳細を見る
Nanoparticles have become widely used in a range of applications. For example, in pharmaceuticals, particles on the nanoscale, such as nanocrystals, are often used as an effective means of drug delivery. Meanwhile in material sciences, nanoparticle coating is an increasingly common way ... 詳細を見る
This example shows how to use the Parameter Estimation and Experiment features in the Reaction Engineering interface for optimization with multiple experimental data input files. The application finds the Arrhenius parameters of a first order reaction where Benzene diazonium chloride ... 詳細を見る
Chemical vapor deposition (CVD) is an important step in the process of manufacturing microchips. One common application is the deposition of silicon on wafers in low pressure reactors to obtain uniform deposition thicknesses. This example models the coupled reaction kinetics, fluid ... 詳細を見る
This example applies the Electrophoretic Transport and Laminar Flow interfaces to model isoelectric separation in a free-flow electrophoresis device. A stream containing six different ionic species is shown to be divided into pure component streams by means of migrative transport in an ... 詳細を見る
This model uses the Reacting Flow multiphysics interface to simulate a methane steam reformer. The model accounts for the interactions between the chemical reactions, the transport of species, the fluid flow, and the heat transfer in a porous medium. 詳細を見る
Silicon carbide (SiC) epitaxial furnaces are a specialized equipment for the production and preparation of SiC epitaxial wafers. This example model demonstrates the process of preparing an SiC epitaxial wafer based on the physical vapor transport (PVT) method in a furnace. This involves ... 詳細を見る
This example considers the thermal cracking of acetone, which is a key step in the production of acetic anhydride. The gas phase reaction takes place under nonisothermal conditions in a plug-flow reactor. As the cracking chemistry is endothermic, control over the temperature in the ... 詳細を見る
