アプリケーションギャラリには電気, 構造, 音響, 流体, 熱および化学分野に関連する COMSOL Multiphysics® チュートリアルおよびデモアプリファイルが用意されています. これらの例はチュートリアルモデルまたはデモアプリファイルとそれに付随する手順をダウンロードすることにより独自のシミュレーション作業の開始点として使用できます.
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This 3D model example demonstrates the use of the Primary Current Distribution interface for modeling current distributions in electrochemical cells. In primary current distribution, the potential losses due to electrode kinetics and mass transport are assumed to be negligible, and ... 詳細を見る
In a redox flow battery electrochemical energy is stored as redox couples in the electrolyte, which is stored in tanks outside the electrochemical cell. During operation, electrolyte is pumped through the cell and, due to the electrochemical reactions, the individual concentrations of ... 詳細を見る
In this application, a solution is pumped through a catalytic bed where a solute species reacts as it gets in contact with the catalyst. The purpose of this example is to maximize the total reaction rate for a given total pressure difference across the bed by finding an optimal catalyst ... 詳細を見る
Galvanic corrosion between two different phases (alpha and beta phases) in a metallic (magnesium) alloy is simulated for a representative cross-sectional microstructure configuration. A key feature in the model formulation is the implementation of both anodic and cathodic regions at ... 詳細を見る
This model illustrates the effect of oxygen and hydrogen formation and recombination on the performance and self-discharge of an electrochemical capacitor with a water-based electrolyte. A load cycle consisting of mixed constant current pulses and rest periods at an open circuit is ... 詳細を見る
This example shows how to use the Parameter Estimation and Experiment features in the Reaction Engineering interface for optimization with multiple experimental data input files. The application finds the Arrhenius parameters of a first order reaction where Benzene diazonium chloride ... 詳細を見る
This space-dependent model describes a stirred semibatch reactor used for producing antibody–drug conjugates. The reactor is set up in 3D and the conjugation reactions, turbulent flow, and concentration fields are simulated as functions of time. The resulting yield and drug-to-antibody ... 詳細を見る
Chemical vapor deposition (CVD) is an important step in the process of manufacturing microchips. One common application is the deposition of silicon on wafers in low pressure reactors to obtain uniform deposition thicknesses. This example models the coupled reaction kinetics, fluid ... 詳細を見る
