アプリケーションギャラリ

Chemical vapor deposition (CVD) is an important step in the process of manufacturing microchips. One common application is the deposition of silicon on wafers in low pressure reactors to obtain uniform deposition thicknesses. This example models the coupled reaction kinetics, fluid ... 詳細を見る

This example model simulates the long-path echo of trumpet sounds reflected from a building 500 m away. The echo can only be heard at night because of the acoustic ray refraction in the atmosphere with different temperature profiles. The model is solved using the ray tracing in the ... 詳細を見る

This tutorial model demonstrates the use of the Moisture Flow coupling node to account for the Stefan flow in moist air, over an evaporation surface. The effects on the velocity field and vapor concentration are presented with different ambient temperature conditions. 詳細を見る

In this application, a solution is pumped through a catalytic bed where a solute species reacts as it gets in contact with the solid catalyst. The purpose of this example is to maximize the total reaction rate for a given total pressure difference across the bed, by finding the optimal ... 詳細を見る

A tweeter is a high frequency driver used in loudspeaker systems. An ideal tweeter will produce a constant sound pressure level at a given distance in front of the driver independently of frequency, that is, a flat response. Ideally the tweeter will also, to a certain degree, maintain ... 詳細を見る

This example models the flow and mass transport in the channels and the gas diffusion layer (GDL) of a polymer electrolyte fuel cell. The cathode electrode reaction is modeled as a boundary condition, where the local current density depends on the overpotential and the local oxygen ... 詳細を見る

真空乾燥は, 製薬業界や食品業界で, 湿った粉末から水や有機溶媒を除去するために頻繁に用いられる化学プロセスです. 真空乾燥システムを設計する際, エンジニアは製品の品質を高く維持しながら乾燥時間を最小限に抑えることを目指します. このモデルは, Nutsche 式フィルタードライヤーにおける真空乾燥を調査します. Nutsche 式フィルタードライヤーは, 湿ったケーキが充填された円筒形のドラムで構成されています. ケーキの上部は低圧のヘッドスペースにさらされ, 側壁と底壁は加熱流体にさらされます. 非常に低い圧力と高温で動作させることで, 液体の蒸発速度が増加し, ... 詳細を見る

This model shows how to simulate moisture redistribution inside a wall with capillary active interior insulation. The wall consists of three layers: brick, mortar and insulating material. At the beginning of simulation, there is a sudden change in vapor pressure and temperature at ... 詳細を見る

One of the most common reactors in the chemical industry, for use in heterogeneous catalytic processes, is the packed bed reactor. This type of reactor is used both in synthesis as well as in effluent treatment and catalytic combustion. The reactor consists in essence of a container ... 詳細を見る

This case shows how to simulate moisture transport in a homogeneous wall under isothermal conditions. With this assumption, an analytical solution can be calculated. The homogeneous layer is initialized in moisture balance. At the beginning of the simulation, the relative humidity of ... 詳細を見る